发明名称 MULTILAYER STRUCTURE AND MANUFACTURING PROCESS OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a multilayer structure comprising a thin film, a substrate and the like being patterned using a matrix of a reversed micelle formed in a solution to have a pore with a configuration, a diameter, a density or the like controlled, and also to provide a multilayer structure having a functional material embedded in the pore in the thin film. SOLUTION: The multilayer structure comprises: a thin film (A) made of an organic polymer and an amphipathic substance and having a pore (P); a substrate (B); and an intermediate layer (C) forming at least a part of an interlayer between the thin film (A) and the substrate (B). A patterned hydrophobic portion (S) composed of the substrate (B) and the intermediate layer (C), or the intermediate layer (C) is disposed on a surface of the intermediate layer (C) side facing the thin film (A). The pore (P) in the thin film (A) is patterned so as to be distributed unevenly in a thin film portion (Ap) facing the hydrophobic portion (S), and the amphipathic substance exists in the periphery of the pore (P). COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007106118(A) 申请公布日期 2007.04.26
申请号 JP20060251385 申请日期 2006.09.15
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 YAMADA YUUKAI
分类号 B32B3/24;B29C41/12;B29C41/22;B29L9/00 主分类号 B32B3/24
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