发明名称 |
Transistor and semiconductor components and production process for thin film silicon on insulator transistor has embedded deformed layer |
摘要 |
<p>A transistor component comprises a substrate on which are, sequentially, a crystalline semiconductor layer (202), a trenched isolation layer, a second crystalline semiconductor layer, a gate electrode (205) and drain and source regions (218) with a deformed semiconductor material (220) within the drain and source regions extending to the first semiconductor layer. Independent claims are also included for the following: (A) A semiconductor component as above;and (B) A production process for a transistor as above.</p> |
申请公布号 |
DE102005052055(B3) |
申请公布日期 |
2007.04.26 |
申请号 |
DE20051052055 |
申请日期 |
2005.10.31 |
申请人 |
ADVANCED MICRO DEVICES INC. |
发明人 |
HOENTSCHEL, JOERG;WEI, ANDY;HORSTMANN, MANFRED;KAMMLER, THORSTEN |
分类号 |
H01L27/12;H01L21/84 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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