发明名称 Transistor and semiconductor components and production process for thin film silicon on insulator transistor has embedded deformed layer
摘要 <p>A transistor component comprises a substrate on which are, sequentially, a crystalline semiconductor layer (202), a trenched isolation layer, a second crystalline semiconductor layer, a gate electrode (205) and drain and source regions (218) with a deformed semiconductor material (220) within the drain and source regions extending to the first semiconductor layer. Independent claims are also included for the following: (A) A semiconductor component as above;and (B) A production process for a transistor as above.</p>
申请公布号 DE102005052055(B3) 申请公布日期 2007.04.26
申请号 DE20051052055 申请日期 2005.10.31
申请人 ADVANCED MICRO DEVICES INC. 发明人 HOENTSCHEL, JOERG;WEI, ANDY;HORSTMANN, MANFRED;KAMMLER, THORSTEN
分类号 H01L27/12;H01L21/84 主分类号 H01L27/12
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