| 摘要 |
PROBLEM TO BE SOLVED: To obtain a high molecular weight polybenzoxazole precursor that substantially does not contain residual halogen, and a polybenzoxazole. SOLUTION: By the process of synthesizing the polybenzoxazole precursor by reacting a bis(o-aminophenol) derivative and a dicarboxylic acid derivative and the subsequent process of water washing treatment and washing treatment with an alkali aqueous solution, manufactured is the polybenzoxazole precursor having a repeating unit represented by general formula (1) and having a residual halogen content of≤0.1 ppm (wherein R indicates a hydrogen atom or a silyl group; A a tetravalent aromatic group; and B a divalent aromatic or aliphatic group). COPYRIGHT: (C)2007,JPO&INPIT
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