| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing apparatus of a liquid crystal device, capable of preventing that an inorganic alignment layer having a desired shape is not obtained caused by plasma and forming the satisfactory inorganic alignment layer, to provide a manufacturing method of the liquid crystal device, to provide the liquid crystal device obtained by these, and to provide electronic equipment. SOLUTION: The manufacturing apparatus of the liquid crystal device having the inorganic alignment layer formed on the inner surface side of a substrate is provided with a film-deposition chamber 2 and a sputtering system 3 for film-depositing an alignment layer material on the substrate W by a sputtering method in the film-deposition chamber 2 to form the inorganic alignment layer. A grounded metal plate 9, for shielding plasma so that the substrate W is not exposed to the plasma generated on a target 5 side, is disposed between the target 5 of the sputtering system 3 and the substrate W in the film-deposition chamber 2. An aperture part 10, for selectively passing the alignment layer material, emitted from the target 5, is provided in the metal plate 9 at a position in an oblique direction that forms a prescribed angle to the target 5. COPYRIGHT: (C)2007,JPO&INPIT
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