发明名称 |
METHOD FOR MAKING AN ANISOTROPIC CONDUCTIVE COATING WITH CONDUCTIVE INSERTS |
摘要 |
<p>A process for manufacturing an anisotropic conducting film including an insulating film in which holes are formed. Conducting inserts are located in the holes. First ends of the inserts project from one side of the insulating film, from a substrate in which compartments are formed on one surface, corresponding to the distribution of inserts on the insulating film, the shape of the compartments being complementary to the shape of the first ends of the inserts. The manufacturing process includes the steps of using a substrate with compartments with a tipped finish, producing an insulating film above the substrate with holes facing the compartments, producing conducting inserts in the holes and the compartments, and separating the insulating film in which the conducting inserts are formed.</p> |
申请公布号 |
EP1008176(B1) |
申请公布日期 |
2007.04.25 |
申请号 |
EP19980939718 |
申请日期 |
1998.07.20 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
CAILLAT, PATRICE;MASSIT, CLAUDE |
分类号 |
H01L21/48;H01L23/32;H01L23/498;H01R13/24;H01R43/00 |
主分类号 |
H01L21/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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