发明名称 |
Electrolytic processing device and substrate processing apparatus |
摘要 |
There is provided an electrolytic processing device including: a processing electrode brought into contact with or close to a workpiece; a feeding electrode for supplying electricity to the workpiece; an ion exchanger disposed in at least one of the spaces between the workpiece and the processing electrode, and between the workpiece and the feeding electrode; a power source for applying a voltage between the processing electrode and the feeding electrode; and a liquid supply section or supplying a liquid to the space between the workpiece and at least one of the processing electrode and the feeding electrode, in which the ion exchanger is present. A substrate processing apparatus having the electrolytic processing device is also provided. |
申请公布号 |
EP1777736(A1) |
申请公布日期 |
2007.04.25 |
申请号 |
EP20060019257 |
申请日期 |
2002.02.21 |
申请人 |
EBARA CORPORATION |
发明人 |
KOBATA, ITSUKI;SHIRAKASHI, MITSUHIKO;KUMEKAWA, MASAYUKI;SAITO, TAKAYUKI;TOMA, YASUSHI;SUZUKI, TSUKURU;YAMADA, KAORU;MAKITA, YUJI |
分类号 |
B24B37/00;H01L21/306;B23H3/00;B23H3/08;B23H3/10;B23H5/08;B24B37/04;C25D7/12;C25D17/00;C25F7/00;H01L21/00;H01L21/304;H01L21/3063 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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