| 发明名称 |
LITHOGRAPHY PROCESS WINDOW PREDICTION BASED ON DESIGN DATA |
| 摘要 |
A method of manufacturing a semiconductor device, comprising providing design data, producing lithography masks based on the design data, predicting a product process window and producing a wafer including semiconductor structures by means of the lithography masks and observing conditions defined by the product process window. |
| 申请公布号 |
US2016162626(A1) |
申请公布日期 |
2016.06.09 |
| 申请号 |
US201615042779 |
申请日期 |
2016.02.12 |
| 申请人 |
GLOBALFOUNDRIES Inc. |
发明人 |
Herrmann Thomas;Schueler Stefan;Samy Aravind Narayana |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of manufacturing a semiconductor device, comprising:
providing design data; producing lithography masks based on said design data; predicting a product process window; and producing a wafer including semiconductor structures by means of said lithography masks and observing conditions defined by said product process window. |
| 地址 |
Grand Cayman KY |
