| 发明名称 |
A method of cleaning a surface of a photomask |
| 摘要 |
The present invention refers to a method of cleaning a surfac 2 in a supercritical state is fed to the vessel (2). As a result, contaminants (11) are efficiently removed from the phot |
| 申请公布号 |
EP1777587(A1) |
申请公布日期 |
2007.04.25 |
| 申请号 |
EP20050109839 |
申请日期 |
2005.10.21 |
| 申请人 |
ADVANCED MASK TECHNOLOGY CENTER GMBH & CO. KG |
发明人 |
CHOVINO, CHRISTIAN;LAMANTIA, MATTHEW |
| 分类号 |
G03F1/00;G03F7/20 |
主分类号 |
G03F1/00 |
| 代理机构 |
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