发明名称 SUPPORT UNIT AND APPARATUS FOR TREATING SUBSTRATE WITH THE SUPPORT UNIT
摘要 The present invention relates to a support unit for supporting a substrate and a substrate treating apparatus including the same. The support unit according to an embodiment of the present invention comprises a body having a cooling passage inside. The cooling passage includes: a supply port for receiving a cooling fluid from the outside; a discharge port for discharging the cooling fluid to the outside; a plurality of main passages each having an inlet end to introduce the cooling fluid and an outlet end to discharge the cooling fluid and concentric with each other; a supply line for connecting the supply port and the inlet end of one of the innermost main passage and the outermost main passage among the main passages; a discharge line for connecting the discharge port and the outlet end of the other of the innermost main passage and the outermost main passage among the main passages; and a connection line for connecting the outlet end of one of the adjacent main passages and the inlet end of the other of the adjacent main passages. One among the discharge line and the supply line passes between the inlet end and the outlet end of each main passage. The support unit of the present invention can improve the cooling uniformity of the entire area of the substrate.
申请公布号 KR20160073830(A) 申请公布日期 2016.06.27
申请号 KR20140182641 申请日期 2014.12.17
申请人 PSD INC. 发明人 KIM, SUN BIN
分类号 H01L21/683 主分类号 H01L21/683
代理机构 代理人
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