| 发明名称 |
PLASMA ETCHING METHOD FOR OPTICALLY TRANSPARENT FILMS OF INDIUM AND TIN OXIDES |
| 摘要 |
A plasma etching method for optically transparent films of indium and tin oxides relates to electronic engineering and can be used in microelectronic technique at forming semitransparent structures on the base of indium and tin oxides.
|
| 申请公布号 |
UA22675(U) |
申请公布日期 |
2007.04.25 |
| 申请号 |
UA20060013072 |
申请日期 |
2006.12.11 |
| 申请人 |
VINNYTSIA NATIONAL TECHNICAL UNIVERSITY |
发明人 |
KRAVCHENKO YURII STEPANOVYCH;PLACHOTNIUK MAKSYM MYKOLAIOVYCH |
| 分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
