发明名称 |
Method of evaluating shape of semiconductor wafer and apparatus for evaluating shape of semiconductor wafer |
摘要 |
The present invention is a method of evaluating a shape of a semiconductor wafer comprising the steps of: measuring shape data of a semiconductor wafer by scanning a front surface and/or a back surface of the semiconductor wafer; calculating a differential profile through a differential process of the measured shape data; analyzing the obtained differential profile and obtaining a surface characteristic of the wafer, and; evaluating a shape of the semiconductor wafer. Thereby, there are provided a method of evaluating a shape of a semiconductor wafer and an apparatus for evaluating a shape thereof, wherein a shape of a semiconductor wafer, particularly a shape of a peripheral portion of the wafer, can be quantitatively evaluated from a viewpoint different from conventional SFQR etc., and the shape quality of the wafer can be accurately evaluated over a specification of a strict design rule.
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申请公布号 |
US7209857(B2) |
申请公布日期 |
2007.04.24 |
申请号 |
US20040517655 |
申请日期 |
2004.12.13 |
申请人 |
SHIN-ETSU HANDOTAI CO., LTD. |
发明人 |
SATO MASAKAZU;ONISHI MASATO |
分类号 |
G01B15/00;G01B21/20;G01B11/06;G01B11/24;G01B21/08;G01R31/26;H01L21/66 |
主分类号 |
G01B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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