| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure method by which an alignment mark can be arranged without degrading the exposing accuracy even when the number of exposing steps is increased. SOLUTION: The layout data of alignment marks on each layer are arranged so that the layout data about the alignment marks on the first and fifth layers may overlap each other in the transversal and longitudinal directions of a chip 1 of an IC pattern. A reticle is prepared based on the layout data and is exposed by shielding one of alignment marks from the light.</p> |
