发明名称 |
OPTICAL CHARACTERISTIC MEASURING DEVICE, OPTICAL CHARACTERISTIC MEASURING METHOD, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>An optical property measurement apparatus (90) is equipped with an optical system unit (93) that selectively places an opening section (97) for passing illumination light, a microlens array (98) for measuring wavefront aberration, and a polarization detection system (99) for measuring a polarization state of the illumination light on an optical path of the illumination light. Accordingly an illumination shape and a size of an illumination optical system, wavefront aberration of a projection optical system and a polarization state of the illumination light can be measured together. Therefore, for example, even when exposure is performed with polarized illumination that is a type of modified illumination, highly-accurate exposure can be achieved by adjusting various optical systems based on the measurement results.</p> |
申请公布号 |
KR20070041491(A) |
申请公布日期 |
2007.04.18 |
申请号 |
KR20077000053 |
申请日期 |
2005.08.09 |
申请人 |
NIKON CORPORATION |
发明人 |
KAISE KOJI;FUJII TORU;MIZUNO YASUSHI |
分类号 |
H01L21/027;G01M11/02;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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