发明名称 Lithographic apparatus and device manufacturing method
摘要 A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
申请公布号 EP1739492(A3) 申请公布日期 2007.04.18
申请号 EP20060253179 申请日期 2006.06.20
申请人 ASML NETHERLANDS B.V. 发明人 KEMPER, NICOLAAS RUDOLF;DONDERS, SJOERD NICOLAAS LAMBERTUS;HOOGENDAM, CHRISTIAAN ALEXANDER;TEN KATE, NICOLAAS;SHULEPOV, SERGEI
分类号 G03F7/20;H01L21/00 主分类号 G03F7/20
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