发明名称 |
Aqueous cleaning composition for removing residues and method using same |
摘要 |
A composition and method for removing residues such as, without limitation, post etched and/or post ashed photoresist, plasma etching, ashing, and mixtures thereof from a substrate is described herein. In one aspect, there is provided a method for removing residues from a substrate comprising: contacting the substrate with a composition comprising: water; a quaternary ammonium hydroxide compound; a fluoride containing compound; and optionally a corrosion inhibitor wherein the composition is free of an added organic solvent and wherein the composition has a pH greater than 9. |
申请公布号 |
EP1775337(A1) |
申请公布日期 |
2007.04.18 |
申请号 |
EP20060021137 |
申请日期 |
2006.10.09 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
WU, AIPING;ROVITO, ROBERTO, JOHN |
分类号 |
C11D7/00;C11D7/28;C11D7/32;G03F7/42;H01L21/02 |
主分类号 |
C11D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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