| 摘要 |
<p>A multilayer reflective film coated substrate includes a multilayer under film comprised of Mo/Si alternately-layered films, an intermediate layer in the form of a Si film, and a multilayer reflective film comprised of Mo/Si alternately-layered films for reflecting exposure light. The multilayer under film, the intermediate layer, and the multilayer reflective film are formed on a substrate in this order. Given that a cycle length of the multilayer under film is d bottom (unit:nm), a thickness of the intermediate layer is d Si (unit:nm), and a cycle length of the multilayer reflective film is d top (unit:nm), relationships of a formula (1) and a formula (2) are satisfied, the formula (1) given by n×d top−0.05≦̸d bottom≦̸n×d top+0.05 where n is a natural number equal to or greater than 1, and the formula (2) given by m×d top−1.2≦̸d Si≦̸−m×d top+1.2 where m is an integer equal to or greater than 0.</p> |
