| 发明名称 |
EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM |
| 摘要 |
The excimer laser apparatus may include a laser chamber configured to contain gas, a pair of electrodes provided in the laser chamber, a power source unit configured to supply a pulse voltage between the pair of electrodes, a gas supply unit configured to supply gas into the laser chamber, a gas exhaust unit configured to partially exhaust gas from within the laser chamber, and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes. |
| 申请公布号 |
US2016254634(A1) |
申请公布日期 |
2016.09.01 |
| 申请号 |
US201615150800 |
申请日期 |
2016.05.10 |
| 申请人 |
Gigaphoton Inc. |
发明人 |
ASAYAMA Takeshi;WAKABAYASHI Osamu;KAKIZAKI Kouji |
| 分类号 |
H01S3/036;H01S3/134;H01S3/225 |
主分类号 |
H01S3/036 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An excimer laser apparatus comprising:
a laser chamber configured to contain gas; a pair of electrodes provided in the laser chamber; a power source unit configured to supply a pulse voltage between the pair of electrodes; a gas supply unit configured to supply gas into the laser chamber; a gas exhaust unit configured to partially exhaust gas from within the laser chamber; and a gas control unit configured to control the gas supply unit and the gas exhaust unit, where a replacement ratio of gas to be replaced from within the laser chamber increases as deterioration of the pair of electrodes progresses, the deterioration being represented by a deterioration parameter of the pair of electrodes. |
| 地址 |
Tochigi JP |
