发明名称 Reverse-conducting IGBT with buffer layer and separation layer for reducing snapback
摘要 In the reverse-conducting IGBT according to the present invention, an n-type buffer layer surrounds a p-type collector layer. A p-type separation layer surrounds an n-type cathode layer. The n-type buffer layer separates the p-type collector layer and the p-type separation layer from each other. The p-type separation layer separates the n-type cathode layer and the n-type buffer layer from each other. Therefore, the present invention makes it possible to reduce snapback.
申请公布号 US9437721(B2) 申请公布日期 2016.09.06
申请号 US201514964772 申请日期 2015.12.10
申请人 Mitsubishi Electric Corporation 发明人 Takahashi Tetsuo
分类号 H01L27/08;H01L29/08;H01L29/10;H01L29/739;H01L29/66;H01L27/06;H01L49/02;H01L29/06;H01L29/417 主分类号 H01L27/08
代理机构 Studebaker & Brackett PC 代理人 Studebaker & Brackett PC
主权项 1. A semiconductor device comprising: an n-type drift layer; a p-type base layer in a channel region on the n-type drift layer; an n-type emitter layer on the p-type base layer; a trench-gate electrode penetrating the p-type base layer and the n-type emitter layer and being in contact with the p-type base layer and the n-type emitter layer through a gate insulating film; a p-type anode layer in a region other than the channel region on the n-type drift layer; an emitter electrode connected to the n-type emitter layer and the p-type anode layer; a p-type collector layer below the n-type drift layer; an n-type cathode layer below the n-type drift layer; a collector electrode connected to the p-type collector layer and the n-type cathode layer; an n-type buffer layer provided between the n-type drift layer and the p-type collector layer; a p-type separation layer provided between the n-type drift layer and the n-type cathode layer; and an embedded oxide film separating the p-type collector layer and the p-type separation layer from each other and separating the n-type cathode layer and the n-type buffer layer from each other.
地址 Tokyo JP