发明名称 Lithographic apparatus and device manufacturing method
摘要 A seal member (12) surrounding a space filled with liquid has a recess (32) in its lower surface which is open to both a relative low pressure source (50) and a relative higher pressure source (40) and through which liquid and/or air from between said seal member and said substrate is extracted.
申请公布号 EP1681597(A3) 申请公布日期 2007.04.18
申请号 EP20060250137 申请日期 2006.01.11
申请人 ASML NETHERLANDS B.V. 发明人 KEMPER, NICOLAAS RUDOLF;DONDERS, SJOERD NICOLAAS LAMBERTUS;HOOGENDAM, CHRISTIAAN ALEXANDER;TEN KATE, NICOLAAS;VAN DER MEULEN, FRITS
分类号 G03F7/20 主分类号 G03F7/20
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