发明名称 COMPOSITION FOR ANTIREFLECTION COATING AND METHOD FOR FORMING PATTERN USING SAME
摘要 <p>The object of the present invention is to provide an anti-reflective coating composition having excellent coating properties while maintaining performance as an anti-reflective film. An anti-reflective coating composition comprising at least the following components (A), (B), (C), (D), and (E) and a production method for a pattern using the anti-reflective coating composition, (A) perfluoroalkyl · alkylenesulfonic acid represented by the following formula (1): C n F 2n+1 (CH 2 CH 2 ) m SO 3 H (1) (wherein, n represents an integer from 1 to 20, and m represents an integer from 0 to 20); (B) organic amine; (C) water-soluble polymer; (D) perfluoroalkylethyl group containing compound represented by the following formula (2): C k F 2k+1 CH 2 CH 2 -X-Y (2) (wherein, k represents an integer from 1 to 20, x represents a single bond or a divalent linking group, y represents an anionic group or a nonionic group, and this compound has a structure different from that of the component (A)); and (E) water.</p>
申请公布号 EP1775633(A1) 申请公布日期 2007.04.18
申请号 EP20050765177 申请日期 2005.06.29
申请人 DAINIPPON INK AND CHEMICALS, INCORPORATED;AZ ELECTRONIC MATERIALS (JAPAN) K.K. 发明人 MATSUO, JIROU;TAKANO, KIYOFUMI;TAKANO, YUSUKE;AKIYAMA, YASUSHI
分类号 G03F7/11;G03F7/004;H01L21/027 主分类号 G03F7/11
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