摘要 |
<p>The object of the present invention is to provide an anti-reflective coating composition having excellent coating properties while maintaining performance as an anti-reflective film. An anti-reflective coating composition comprising at least the following components (A), (B), (C), (D), and (E) and a production method for a pattern using the anti-reflective coating composition, (A) perfluoroalkyl · alkylenesulfonic acid represented by the following formula (1): C n F 2n+1 (CH 2 CH 2 ) m SO 3 H (1) (wherein, n represents an integer from 1 to 20, and m represents an integer from 0 to 20); (B) organic amine; (C) water-soluble polymer; (D) perfluoroalkylethyl group containing compound represented by the following formula (2): C k F 2k+1 CH 2 CH 2 -X-Y (2) (wherein, k represents an integer from 1 to 20, x represents a single bond or a divalent linking group, y represents an anionic group or a nonionic group, and this compound has a structure different from that of the component (A)); and (E) water.</p> |
申请人 |
DAINIPPON INK AND CHEMICALS, INCORPORATED;AZ ELECTRONIC MATERIALS (JAPAN) K.K. |
发明人 |
MATSUO, JIROU;TAKANO, KIYOFUMI;TAKANO, YUSUKE;AKIYAMA, YASUSHI |