发明名称 Sputtering target, method of producing the target and method of fabricating an optical recording medium
摘要 <p>A sputtering target for fabricating a recording layer of a phase-change type optical recording medium contains a compound or mixture including as constituent elements Ag, In, Te and Sb with the respective atomic percent (atom.%) of alpha , beta , gamma and delta thereof being in the relationship of 2 &lt;/= alpha &lt;/= 30, 3 &lt;/= beta &lt;/= 30, 10 &lt;/= gamma &lt;/= 50, 15 &lt;/= delta &lt;/= 83 and alpha + beta + gamma + delta = 100, and a method of producing the above sputtering target is provided. A phase-change type optical recording medium includes a recording layer containing as constituent elements Ag, In, Te and Sb with the respective atomic percent of alpha , beta , gamma , and delta thereof being in the relationship of 0 &lt; alpha &lt;/= 30, 0 &lt; beta &lt;/= 30, 10 &lt;/= gamma &lt;/= 50, 10 &lt;/= delta &lt;/= 80, and alpha + beta + gamma + delta = 100, and is capable of recording and erasing information by utilizing the phase changes of a recording material in the recording layer. A method of fabricating the above phase-change type optical recording medium is also provided.</p>
申请公布号 EP0969457(B1) 申请公布日期 2007.04.18
申请号 EP19990120157 申请日期 1995.12.13
申请人 RICOH COMPANY, LTD. 发明人 YAMADA, KATSUYUKI;IWASAKI, HIROKO;IDE, YUKIO;HARIGAYA, MAKOTO;KAGEYAMA, YOSHIYUKI;DEGUCHI, HIROSHI;TAKAHASHI, MASAETSU;HAYASHI, YOSHITAKA
分类号 G11B7/26;B22F1/00;B22F3/10;B32B3/00;B32B3/02;C22C1/04;C23C14/06;C23C14/34;G11B7/243;G11B7/253;G11B7/2534;G11B7/254;G11B7/2542;G11B7/258;G11B7/2585;G11B7/259;G11B7/2595 主分类号 G11B7/26
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