发明名称 |
Bestralingswerkwijze en apparaat voor onderdompelingslithografie. |
摘要 |
A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid. |
申请公布号 |
NL1032675(A1) |
申请公布日期 |
2007.04.17 |
申请号 |
NL20061032675 |
申请日期 |
2006.10.13 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
CHING-YU CHANG;CHIN-HSIANG LIN;BURN-JENG LIN;DING-CHUNG LU |
分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|