发明名称 Polydiode structure for photo diode
摘要 An integrated circuit device for converting an incident optical signal into an electrical signal comprises a semiconductor substrate, a well region formed inside the semiconductor substrate, a dielectric layer formed over the well region, and a layer of polysilicon for receiving the incident optical signal, formed over the dielectric layer, including a p-type portion, an n-type portion and an undoped portion disposed between the p-type and n-type portions, wherein the well region is biased to control the layer of polysilicon for providing the electrical signal.
申请公布号 US7205641(B2) 申请公布日期 2007.04.17
申请号 US20040017053 申请日期 2004.12.21
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 SHIU YU-DA;CHANG CHYH-YIH;KER MING-DOU;CHUANG CHE-HAO
分类号 H01L31/075;H01L21/00;H01L27/146;H01L31/0352;H01L31/062;H01L31/105 主分类号 H01L31/075
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