| 摘要 |
One embodiment relates to a scanning electron beam apparatus having curved electron-optical axes. An electron gun and illumination electron optics are configured to generate a primary electron beam along a first axis. Objective electron optics is configured about a second axis to receive the primary electron beam, to focus the incident electron beam onto the substrate, and to retrieve an emitted beam of scattered electrons from the substrate. Detection electron optics is configured about a third axis to receive the emitted beam and to focus the emitted beam onto a detector. A beam separator is coupled to and interconnecting the illumination electron optics, the objective electron optics, and the detection electron optics in such a way that there is a same angle between the first and second axes as between the second and third axes. A beam deflector is configured to controllably scan the primary electron beam across the substrate and to de-scan the emitted electron beam. Other embodiments are also disclosed.
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