发明名称 Mask for laser irradiation and apparatus for laser crystallization using the same
摘要 A laser beam mask for shaping a laser beam includes a base substrate having first and second surfaces and having at least one first open portion, and a reflecting layer on the first surface of the base substrate, wherein the reflecting layer has at least one second open portion corresponding to the at least one first open portion and totally reflects the laser beam.
申请公布号 US7205076(B2) 申请公布日期 2007.04.17
申请号 US20030705891 申请日期 2003.11.13
申请人 LG.PHILIPS LCD CO., LTD. 发明人 JUNG YUN-HO
分类号 G03F1/00;G03B27/00;G03F1/14 主分类号 G03F1/00
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