发明名称 |
RESIST FILM REMOVING METHOD, CONTROL PROGRAM AND COMPUTER-READABLE STORAGE MEDIUM |
摘要 |
<p>A resist film removing method for removing a resist film disposed on a substrate and having a cured layer at a surface includes covering the surface of the resist film with a protection film; causing popping in the resist film covered with the protection film; denaturing the resist film and the protection film after causing popping, to be soluble in water; and performing purified water cleaning to remove from the substrate the resist film and the protection film denatured to be soluble in water.</p> |
申请公布号 |
KR20070040297(A) |
申请公布日期 |
2007.04.16 |
申请号 |
KR20060093331 |
申请日期 |
2006.09.26 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
ORII TAKEHIKO;SEKIGUCHI KENJI;IINO TADASHI |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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