| 摘要 |
<p>An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto a substrate, the projection optical system including an optical element closest to the substrate, an illumination optical system for illuminating the reticle using light from a light source, and a temperature controller for controlling a temperature of the optical element and thereby a temperature of a fluid that is filled in a space between the optical element in the projection optical system and the substrate, the exposure apparatus exposing the substrate via said projection optical system and the fluid.</p> |
