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发明名称
METHOD OF MANUFACTURING A SILICON DIOXIDE LAYER
摘要
申请公布号
KR20070039960(A)
申请公布日期
2007.04.13
申请号
KR20077004244
申请日期
2007.02.22
申请人
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
发明人
BOURDELLE KONSTANTIN;DAVAL NICOLAS;CAYREFOURCQ IAN;VAN AERDE STEVEN R. A.;DE BLANK MARINUS J.;VAN DER JEUGD CORNELIUS A.
分类号
H01L21/316
主分类号
H01L21/316
代理机构
代理人
主权项
地址
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