发明名称 METHOD OF CLEANING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, DISPLAY, SUBSTRATE FOR DEVICE CLEANING, AND DEVICE FOR DEVELOPING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method of cleaning a substrate capable of preventing the mist containing cleaning liquid that occurs from sticking to the substrate, when the cleaning liquid collides with and is rebounded from the substrate during cleaning of the substrate. SOLUTION: A substrate 22 is rotated at a predetermined rotation speed. A cleaning liquid is supplied to the substrate 22 by a predetermined supply amount and then the cleaning liquid which is supplied to the substrate 22 rebounds from the substrate 22 to cause mist. The amount of mist present above the substrate 22 is detected in a substrate cleaning container 24. The rotation speed of the substrate 22 is controlled according to the detected amount of mist, to suppress the occurrence of mist, thereby preventing the mist containing cleaning liquid from sticking to the substrate 22. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007095960(A) 申请公布日期 2007.04.12
申请号 JP20050282746 申请日期 2005.09.28
申请人 SHARP CORP 发明人 NINOMIYA KOJI
分类号 H01L21/304;H01L21/027 主分类号 H01L21/304
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