发明名称 |
METHOD FOR MANUFACTURING PATTERN FORMING ASSEMBLY AND APPARATUS FOR MANUFACTURING PATTERN FORMING ASSEMBLY |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a pattern forming assembly by which a characteristics change pattern can be formed with high definition into a target pattern even when the pattern forming assembly is continuously manufactured, and to provide an apparatus for manufacturing a pattern forming assembly to be used for the above method. <P>SOLUTION: The method for manufacturing a pattern forming assembly aims to manufacture a plurality of pattern forming assemblies by carrying out a plurality of times of a pattern forming step of forming a pattern forming assembly by irradiating a pattern forming substrate the surface characteristics of which are changed by an effect of vacuum UV rays with vacuum UV rays through a photomask so as to form a characteristics change pattern with the characteristics changed on the surface of the pattern forming substrate. The method includes a deposit removing step of removing a substance depositing on the photomask, the removing step carried out during the pattern forming steps carried out in a plurality of times. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007094183(A) |
申请公布日期 |
2007.04.12 |
申请号 |
JP20050285484 |
申请日期 |
2005.09.29 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
SAWADA TAKASHI;YAMASHITA KAORI;KOBAYASHI HIRONORI |
分类号 |
G03F7/20;G02B5/20;G02F1/1335;G03F1/72;G03F1/74 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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