EXPOSING/DEVELOPING/CLEANING METHOD AND DEVICE THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a developing device and an exposing/developing method for facilitating pattern formation with high resolution, improving mass-productivity and providing a product of high quality by exposure using a proximity exposure system in the exposing/developing steps of a method for manufacturing a color filter for processing a photosensitive resin composition applied on a substrate into a black matrix or a colored pattern.

SOLUTION: The exposing/developing method and the developing device for manufacturing a color filter are characterized in that: low illuminance exposure is carried out in the proximity exposure system; development is carried out at high discharge pressure of a developer solution from a nozzle; and hydrogen water ultrasonic cleaning is carried out as washing after development and rinsing.

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