发明名称 |
Optimized modules' proximity correction |
摘要 |
A method comprising dissecting a photomask pattern layout into a plurality of segments, each segment having at least one evaluation point, applying a rule-based MPC to the photomask pattern layout and generating a rule-based MPC result, and applying a model-based MPC to the plurality of segments of the photomask pattern layout and generating an MPC correction that is influenced by the rule-based MPC result.
|
申请公布号 |
US2007083846(A1) |
申请公布日期 |
2007.04.12 |
申请号 |
US20050192254 |
申请日期 |
2005.07.28 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHUANG HARRY;KUO CHENG-CHENG |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|