| 摘要 |
PROBLEM TO BE SOLVED: To provide a rinse treating method capable of drying a substrate without generating a pattern collapse, inhibiting the fluctuation of a pattern line-width, reducing the remaining of a precipitation system defect, and improving productivity in a rinse treatment for the substrate after development processing, a development processing method and a developing device. SOLUTION: The rinse treating method washes the substrate W after an exposure pattern is subjected to development processing. The rinse treating method carries out a step S5 supplying pure water on the substrate W and washing the substrate by pure water, a step S6 supplying, on the substrate W, a first rinsing liquid composed of a surface active agent having a specified concentration and washing the substrate by the first rinsing liquid, and a step S7 supplying, on the substrate W, a second rinsing liquid composed of a surface active agent having a concentration lower than the first rinsing liquid and washing the substrate by the second rinsing liquid. COPYRIGHT: (C)2007,JPO&INPIT |
