发明名称 X-RAY FOCUSING ARRANGEMENT
摘要 PROBLEM TO BE SOLVED: To irradiate a microregion on a sample with X rays of a high intensity by improving the focus blur at a focusing end of a multi-capillary X-ray lens. SOLUTION: A drawing member 3 whose inner surface shaped like a truncated cone is mirror-finished is set up outside the focusing end 2a on the exit side of the multi-capillary X-ray lens (MCX) 2, the X rays emitted from an X-ray source by the MCX 2 are efficiently collected, the diameter of the X rays is reduced to some extent, the X rays are introduced into the drawing member 3 and the convergence diameter of the X rays is reduced further while giving the total reflection of the X rays on the inner surface of the drawing member 3; so that the X rays can be focused on a small region 4. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007093315(A) 申请公布日期 2007.04.12
申请号 JP20050281021 申请日期 2005.09.28
申请人 SHIMADZU CORP 发明人 SOEJIMA HIROYOSHI;KITAMURA TOSHIAKI
分类号 G21K1/06;G21K1/00 主分类号 G21K1/06
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