| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive film having high sensitivity and less surface tackiness, excellent in peelability from a protective film and a support, excellent also in developability and storage stability, ensuring excellent plating resistance, surface hardness and resolution after development, and capable of forming a high-definition pattern, a permanent pattern forming method by which high-definition permanent patterns in the semiconductor field (such as a protective film, an interlayer insulation film and a solder resist pattern) can be efficiently formed with high definition, and a pattern suitable for use in production of a printed circuit board or the like including a package substrate. <P>SOLUTION: The photosensitive film has at least a support, a photosensitive layer comprising a photosensitive composition on the support, and a protective film on the photosensitive layer, wherein the photosensitive composition contains at least (A) a binder containing at least an acid group-containing epoxy acrylate compound modified with polysiloxane, (B) a polymerizable compound, (C) a photopolymerization initiator and (D) a heat crosslinking agent. The permanent pattern forming method and the pattern are also provided. <P>COPYRIGHT: (C)2007,JPO&INPIT |
