| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multilayer film reflecting mirror having a high-precision facial shape. <P>SOLUTION: In this multilayer film reflecting mirror 2 equipped with multilayer films 6a, 6b having a structure wherein a layer including Mo and a layer including Si are formed periodically alternately on the substrate 4 surface, a distribution of removal amount is generated in the plane, and multilayer films 6c of a low-stress structure part provided near the surface of the multilayer films 6a, 6b are removed. In the reflecting mirror 2, the multilayer films 6c of the low-stress structure part has a stress absolute value of 50 MPa or lower. <P>COPYRIGHT: (C)2007,JPO&INPIT |
