| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and a device for film forming an optical thin film of which the film thickness unevenness is suppressed as low as possible even with respect to a lens with little curvature radius (large D/R), and which uniformly possesses film characteristics, starting with optical characteristics, irrespective of its section on the film; and also to provide an optical element, an optical system, and an exposing device. <P>SOLUTION: The method for film forming the optical thin film to form a single layer or multiple layer optical thin film 14 comprises applying an application liquid 17 to a surface of an optical element main body 13 which is circular in a plan view and has the convex shaped surface. The method for film forming the optical thin film includes: rotating the optical element main body 13 while taking a center axis O of the convex shape as a center; and simultaneously sequentially applying the application liquid 17 to the convex shape along a direction of a radius of the circle from a peripheral section 13a of the convex shape to its center O1. <P>COPYRIGHT: (C)2007,JPO&INPIT |
