| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposing apparatus which includes a projection optical system that can prevent a liquid (pure water) on a liquid intruding area formed on a light incident surface side of a lens on the wafer side-most from traveling over the lens surface to intrude into a space on the downside of the lens of the wafer side-most. <P>SOLUTION: The exposing apparatus has a plurality of optical elements, where the liquid intruding area LT1 are formed in an optical path space on a light emitting surface side of a specified optical element LS7 on a light sensitive substrate W side among each optical elements, and the pattern formed on the mask R is projected on the light sensitive substrate W by a projection optical system PL. The exposing apparatus includes a boundary outline 50 which is located outside the effective area of light incident surface side of the specified optical element LS7 along the edge of the specified optical element, and a liquid repellant film 51 which is located at least on a part of the surface of the specified optical element outside the boundary outline. <P>COPYRIGHT: (C)2007,JPO&INPIT |
