发明名称 |
CaF2 SINGLE CRYSTAL HAVING INCREASED LASER RESISTANCE, AND ITS PRODUCTION METHOD AND APPLICATION |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a CaF<SB>2</SB>material which exhibits high radiation resistance even after it is used as a laser material for a long period of time or it is used under high energy or laser pulses with high energy density. <P>SOLUTION: A method for producing a CaF<SB>2</SB>single crystal with increased radiation resistance comprises growing a crystal under controlled conditions of solidification from a melt of a crystal raw material containing a dopant. The melt of CaF<SB>2</SB>contains, as the dopant, Al and/or Ga and/or In and/or Tl ion. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007091583(A) |
申请公布日期 |
2007.04.12 |
申请号 |
JP20060252110 |
申请日期 |
2006.09.19 |
申请人 |
SCHOTT AG |
发明人 |
GOENNA GORDON VON DER;PARTHIER LUTZ;WEHRHAN GUNTHER;LETZ MARTIN |
分类号 |
C30B29/12;G02B1/02;G03F7/20;H01L21/027 |
主分类号 |
C30B29/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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