| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method or the like for manufacturing a photomask blank capable of efficiently reducing film stress. <P>SOLUTION: The method for manufacturing the photomask blank having at least a film for forming a mask pattern on a transparent substrate comprises a film forming process for sputter-forming the film for forming the mask pattern by containing at least helium gas in sputtering atmosphere and a process for heating the transparent substrate during or after the film forming process. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
