Method for protection of delicate nano-structures from scratching, e.g. for silicon wafers, involves application of spin-on-glass in several discrete steps

摘要

A method for protection of a layer, which consists of needle-shaped silicon peaks with a large aspect-ratio of 4:1 and larger with nanometer dimensions. A spin-on-glass is applied in several steps and in its properties meets the requirements matched to passivating layer and following each application is tempered until a smooth surface is formed.