发明名称 |
METHOD AND SYSTEM FOR SUBSTRATE TEMPERATURE PROFILE CONTROL |
摘要 |
A method and system are provided for rapid temperature profile control of the upper surface of a substrate holder providing a specified uniformity or specified non-uniformity of the temperature profile on that surface. The substrate holder includes a first fluid channel positioned in a first thermal zone, utilizing a heat transfer fluid at a specified flow rate and at a specified temperature, to control the temperature profile of the first thermal zone of the surface of the substrate holder. A second fluid channel positioned in a second thermal zone of the substrate holder, utilizing a heat transfer fluid at a specified flow rate and at a specified temperature, is configured to control the temperature profile of the second thermal zone of the surface of the substrate holder.
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申请公布号 |
WO2006022997(A3) |
申请公布日期 |
2007.04.12 |
申请号 |
WO2005US20529 |
申请日期 |
2005.06.10 |
申请人 |
TOKYO ELECTRON LIMITED;TSUKAMOTO, YUJI;MOROZ, PAUL;IWAMA, NOBUHIRO;HAMAMOTO, SHINJI |
发明人 |
TSUKAMOTO, YUJI;MOROZ, PAUL;IWAMA, NOBUHIRO;HAMAMOTO, SHINJI |
分类号 |
H01L21/306;C23C14/50;C23F1/00 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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