| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase surface flatness of a color filter and to improve accuracy of a color filter by suppressing a buildup in an overlapped portion of a black matrix and a color layer. <P>SOLUTION: The method for manufacturing a color filter, after a color layer is applied on a transparent substrate (substrate) W having a black matrix formed thereon, the color layer is subjected to exposure along the pattern of an aperture 7a of a photomask 7 via a projection lens 4b by using a projection exposure device 1 so as to form a colored filter on the transparent substrate W, wherein the projection exposure device 1 is equipped with a light equalization means 4a in the exposure optical system 4, and when exposing the color layer by irradiating the transparent substrate W by the projection lens 4b with exposure light passing through the light equalization means 4a, the distance between the projection lens 4b and the surface of the transparent substrate W to be exposed is shorter or longer by 350 to 700 μm than the focal length of the projection lens 4b. <P>COPYRIGHT: (C)2007,JPO&INPIT |
