| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a target for being used in a polarization lithography and its use method. <P>SOLUTION: Included therein are a first structural part positioned on a reference layer and a second structural part positioned on a second layer. The second layer has a light transmittance property so that the first structural part is visible through the second layer. The second structural part is formed of a photomask having a plurality of sub-structural parts. Every sub-structural part of the plurality of sub-structural parts is oriented in a first orientation direction. Polarization is used for patterning the second structural part on the second layer, and the polarization has the same polarization direction as the first orientation direction. <P>COPYRIGHT: (C)2007,JPO&INPIT |
