| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device with processing efficiency and device working efficiency improved by shortening maintenance time. SOLUTION: A vacuum processing device includes a vacuum vessel in which a substrate-like specimen is placed in an internally provided and decompressed processing chamber, a conveyance vessel having the vacuum vessel coupled in which the specimen is carried in a decompressed atmosphere, a path for communicating a conveyance chamber with the processing chamber with the conveyance vessel coupled with the vacuum vessel in which the specimen before or after the processing is carried, and a detachable cover member attached to cover an inner wall surface of the path for processing the specimen in the processing chamber using plasma formed in the processing chamber. COPYRIGHT: (C)2007,JPO&INPIT
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