| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-processing apparatus capable of preventing operation failure caused by liquid adhering to a substrate in an aligner. SOLUTION: In a conveyance process, post-exposure baking (PEB) is performed to the substrate W which is subjected to cleaning and drying treatment in a cleaning/drying treatment unit at a cleaning/drying treatment section 80, at a heat treatment section 151 for post-exposure baking in a cleaning/drying treatment block 15. In this case, the cleaning and drying treatment is performed to the substrate W after exposure processing at the cleaning/drying treatment section 80, and a sixth center robot CR6 takes the substrate out of the cleaning/drying treatment section 80 and carries the substrate W into the heat treatment section 151 for post-exposure baking in the cleaning/drying treatment block 15. COPYRIGHT: (C)2007,JPO&INPIT
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