PATTERN DEFECT INSPECTION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a defect inspection apparatus capable of highly accurately detecting pattern defects without reducing the light quantity of a laser beam used for defect detection. SOLUTION: The pattern defect inspection apparatus comprises a stage for moving a sample; an irradiation system for irradiating the sample with a laser beam from a laser beam source; a TDI (Time Delay Integration) image sensor for detecting light from the sample; a sensitivity correction circuit for correcting the detection sensitivity of the image sensor; and a defect determination circuit for determining defects of the sample on the basis of output of the sensitivity correction circuit. A light quantity detector for receiving light from the sample is provided adjacently to the image sensor to acquire information on changes in the light quantity of the laser light source. The sensitivity correction circuit corrects the detection sensitivity of the image sensor on the basis of both information on changes in the speed of the stage and the information on changes in the light quantity of the laser light source. COPYRIGHT: (C)2007,JPO&INPIT