| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which can obtain an etching grade higher than a conventional one, where a damage of a treated matter due to etching is little, and which can produce a surface wave downstream negative ion in a radio frequency band; and to provide a plasma producing method. <P>SOLUTION: A ring-shaped feeding portion is attached on an outside surface of a cylindrical body whose relative permittivity is 40-200 so that the whole is arranged from the longitudinal center of the cylindrical body towards one edge side. <P>COPYRIGHT: (C)2007,JPO&INPIT |
