| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition capable of ensuring satisfactory improvement of sensitivity, exposure latitude and pattern collapse, in a process of producing a semiconductor such as IC and in production of a circuit board of a liquid crystal, a thermal head or the like, and a pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition comprises (A) a resin including a cyclic sulfonamide partial structure represented by formula (S1), and having solubility in an alkali developer increased by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent. <P>COPYRIGHT: (C)2007,JPO&INPIT |
