| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition having a large DOF and a good EL margin, and a resist pattern forming method. <P>SOLUTION: The positive resist composition contains a resin component (A) whose alkali solubility is increased by the action of an acid and an acid generator component (B) capable of generating an acid upon exposure, wherein the acid generator component (B) contains an oxime sulfonate-based acid generator (B1) represented by formula (B-1) (wherein R<SP>33</SP>is haloalkyl group; R<SP>34</SP>is aryl group; and R<SP>35</SP>is haloalkyl group) and an onium salt-based acid generator (B2). <P>COPYRIGHT: (C)2007,JPO&INPIT |
